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RBPMW Studio Immersion Project 
Studio Immersion Project (SIP) is an intensive 3 month studio fellowship designed to immerse artists in the world of printmaking. SIP Fellows will acquire new techniques and build upon existing skills. Artists, from all media, interested in making printmaking a regular part of their creative practice are invited to apply.

SIP Eligibility
A SIP fellowship is ideal for artists with a developed studio practice and career experience.
Applicants cannot have an affiliation with any institution as a full or part time student at the time of application.
Applicants cannot have received any other fellowship from RBPMW in the past 2 years.
Prior printmaking experience is not required. Artists working in other media are strongly encouraged to apply.

THERE IS NO ENTRY FEE.


Eligibility is limited to artists living and working in New York State.
Artists must be able to spend a minimum of 24 hours working in the studio each week from 6/5/14 – 8/31/14.
     RBPMW Hours:
     Monday: CLOSED
     Tuesday - Friday: 10.00 am - 10.00 pm
     Saturday - Sunday: 10.00 am - 6.00 pm

Artists must be able attend all sessions of SIP 2014 Introduction during the week of June 5 -11.
 

SIP Award Description
SIP recipients will receive the following: 
1 year RBPMW membership   
3 months unlimited RBPMW studio access (6/5/14 – 8/31/14) 
Monthly stipend 
Materials stipend 
6 session SIP 2014 Introduction
Includes: In depth studio orientation, basic intaglio, lithography, relief and monotype techniques.
3 RBPMW classes picked from Summer 2014 Class Schedule. 
Includes: Monoprint, Watercolor Monotype, Chine Collé, Engraving, Beginning Etching, Photoshop for Artists, Ukiyo-e, Stone Lithography, Collograph, Photo Lithography, Bookbinding, and Solar Plate Etching
SIP Fellows group exhibition in Blackburn 20|20 during the summer of 2015
Scheduled project consultation with RBPMW staff printers 
3 month material & supply storage 
Access to exhibition and portfolio exchange opportunities through RBPMW membership
*Subject to change

Selection Process
Selection is based on artistic merit determined by an independent 3 person interdisciplinary panel in a blind jury. Jurors will be made public following the announcement of selected participants.

Deadlines & notifications
All applications must be submitted by 6.00 pm, Wednesday, April 23, 2014.
All applicants will be notified of the outcome of their application via email by Tuesday, May 21, 2014.